Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography

D'Urzo, LuciaLuciaD'UrzoFoubert, PhilippePhilippeFoubertStokes, HaroldHaroldStokesThouroude, YanYanThouroudeXia, A.A.XiaWu, A.A.Wu2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25235Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithographyProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2211105