Characterization of porous structure in ultra-low-k dielectrics by depositing thin conductive cap layers

Iacopi, FrancescaFrancescaIacopiTokei, ZsoltZsoltTokeiStucchi, MicheleMicheleStucchiBrongersma, SywertSywertBrongersmaVanhaeren, DanielleDanielleVanhaerenMaex, KarenKarenMaex2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7677Characterization of porous structure in ultra-low-k dielectrics by depositing thin conductive cap layersJournal article