Silicon layer used as a holes detector in thin HfO2 films deposited by atomic layer deposition

Richard, OlivierOlivierRichardBender, HugoHugoBenderPuurunen, RiikkaRiikkaPuurunenKaushik, VidyaVidyaKaushik2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9508Silicon layer used as a holes detector in thin HfO2 films deposited by atomic layer depositionProceedings paper