Kishimura, ShinjiShinjiKishimuraGronheid, RoelRoelGronheidErcken, MoniqueMoniqueErckenMaenhoudt, MireilleMireilleMaenhoudtMatsuo, TakahiroTakahiroMatsuoEndo, MasayukiMasayukiEndoSasago, MasaruMasaruSasago2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10698Impact of water and top-coats on lithographic performance in 193nm immersion lithographyProceedings paper