Sleeckx, ErikErikSleeckxSchaekers, MarcMarcSchaekersShi, XiaopingXiaopingShiKunnen, EddyEddyKunnenDegroote, BartBartDegrooteJurczak, GosiaGosiaJurczakde Potter de ten Broeck, MurielMurielde Potter de ten BroeckAugendre, EmmanuelEmmanuelAugendre2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9610Optimization of low-tempurature silicon nitride processes for improvement of device performanceProceedings paper