A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography

de Marneffe, Jean-FrancoisJean-Francoisde MarneffeGoossens, DannyDannyGoossensVandervorst, AlainAlainVandervorstDemuynck, StevenStevenDemuynckGoethals, MiekeMiekeGoethalsHermans, JanJanHermansVan Roey, FriedaFriedaVan RoeyBaudemprez, BartBartBaudemprezBrus, StephanStephanBrusVrancken, ChristaChristaVrancken2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13606A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithographyMeeting abstracthttp://www2.avs.org/symposium2008/Papers/Paper_MS+NC-MoM1.html