Defect generation in high-k gate dielectric stacks under electrical stress: the impact of hydrogen

Houssa, MichelMichelHoussaPourtois, GeoffreyGeoffreyPourtoisStesmans, AndreAndreStesmansHeyns, MarcMarcHeyns2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10617Defect generation in high-k gate dielectric stacks under electrical stress: the impact of hydrogenJournal article