Blanco, VictorVictorBlancoRoy, S.S.RoyChowrira, B.B.ChowriraPham, Van TuongVan TuongPhamWouters, J.J.WoutersDas, S.S.DasDecoster, StefanStefanDecosterLeray, PhilippePhilippeLerayLiu, Ru-GunRu-GunLiuRonse, KurtKurtRonseVandenberghe, GeertGeertVandenbergheNiroomand, ArdavanArdavanNiroomandFoubert, PhilippePhilippeFoubertRutigliani, V. D.V. D.RutiglianiSuh, Hyo SeonHyo SeonSuhGupta, MihirMihirGuptaDe Simone, DaniloDaniloDe SimoneDusa, MirceaMirceaDusaBeral, ChristopheChristopheBeralPhilipsen, VickyVickyPhilipsenWiaux, VincentVincentWiauxFranke, Joern-HolgerJoern-HolgerFrankeBekaert, JoostJoostBekaertBaskaran, BalakumarBalakumarBaskaranGillijns, WernerWernerGillijnsKim, Ryan Ryoung HanRyan Ryoung HanKimSherazi, YasserYasserSheraziVats, H.H.VatsCupak, MiroslavMiroslavCupakChang, C.C.ChangLin, Y.-J.Y.-J.LinLee, J.J.LeeHwang, SoobinSoobinHwangYang, KihoKihoYangMiyaguchi, KenichiKenichiMiyaguchi2025-08-292025-08-292024978-1-5106-8157-60277-786XWOS:001536747100002https://imec-publications.be/handle/20.500.12860/46128Logic and memory patterning breakthrough using High-NA lithographyProceedings paper10.1117/12.3047176978-1-5106-8158-3WOS:001536747100002