Exploring double patterning approaches for 22-nm half-pitch gate structures

Locorotondo, SabrinaSabrinaLocorotondoVangoidsenhoven, DizianaDizianaVangoidsenhovenWouters, Johan M. D.Johan M. D.WoutersMiller, AndyAndyMillerDemand, MarcMarcDemandBoullart, WernerWernerBoullart2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14057Exploring double patterning approaches for 22-nm half-pitch gate structuresProceedings paper