Applications of Ni-based silicides to 45 nm CMOS and beyond

Kittl, JorgeJorgeKittlLauwers, AnneAnneLauwersChamirian, OxanaOxanaChamirianPawlak, MalgorzataMalgorzataPawlakVan Dal, MarkMarkVan DalAkheyar, AmalAmalAkheyarde Potter de ten Broeck, MurielMurielde Potter de ten BroeckKottantharayil, AnilAnilKottantharayilPourtois, GeoffreyGeoffreyPourtoisLindsay, RichardRichardLindsayMaex, KarenKarenMaex2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9129Applications of Ni-based silicides to 45 nm CMOS and beyondProceedings paper