Bruls, R. J.R. J.BrulsUitterdijk, T.T.UitterdijkCicilia, O.O.CiciliaDe Bisschop, PeterPeterDe Bisschop2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7262Hard pellicle investigation for 157nm lithography : impact on overlayProceedings paper