Schwalm, R.R.SchwalmBinder, H.H.BinderFischer, T.T.FischerFunhoff, D.D.FunhoffGoethals, MiekeMiekeGoethalsGrassmann, A.A.GrassmannMoritz, H.H.MoritzPaniez, P.P.PaniezReuhman-Huisken, M.M.Reuhman-HuiskenVinet, F.F.VinetDijkstra, H.H.DijkstraKrause, A.A.Krause2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/496Robust and environmentally stable deep UV positive resist: optimization of SUCCESS ST2Proceedings paper