Dorney, KevinKevinDorneyKissoon, NicolaNicolaKissoonHolzmeier, FabianFabianHolzmeierWitting Larsen, EsbenEsbenWitting LarsenSingh, DhirendraDhirendraSinghArvind, ShikharShikharArvindSantra, SayantaniSayantaniSantraFallica, RobertoRobertoFallicaMakhotkin, IgorIgorMakhotkinPhilipsen, VickyVickyPhilipsenDe Gendt, StefanStefanDe GendtFleischmann, ClaudiaClaudiaFleischmannvan der Heide, PaulPaulvan der HeidePetersen, JohnJohnPetersen2023-05-232023-05-222023-05-232023-04-281996-756Xhttps://imec-publications.be/handle/20.500.12860/41605Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometryProceedings paperhttp://dx.doi.org/10.1117/12.2658359EUV, EUV lithography, photoresists, reflectometry, absorption coefficient, Dill parameters, thin films, interfaces, optical constants