TiN/TaN selective etch in replacement metal gate with chlorine based plasmas

Tao, ZhengZhengTaoParaschiv, VasileVasileParaschivDekkers, HaroldHaroldDekkersDangol, AnishAnishDangolsoon aik, chewchewsoon aik2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24599TiN/TaN selective etch in replacement metal gate with chlorine based plasmasMeeting abstract