Unavoidable renaissance of electron metrology in the age of high numerical aperture extreme ultraviolet lithography

Lorusso, GianGianLorusso2024-04-252024-01-092024-04-2520231932-5150WOS:001122013000011https://imec-publications.be/handle/20.500.12860/43370Unavoidable renaissance of electron metrology in the age of high numerical aperture extreme ultraviolet lithographyJournal article10.1117/1.JMM.22.2.021005WOS:001122013000011