Integration of the Sequential Infiltration Synthesis (SIS) on Polyphtaladehyde (PPA) resist for thermal Scanning Probe Lithography (t-SPL) patterning

Chan, BTBTChande Marneffe, Jean-FrancoisJean-Francoisde MarneffeSpieser, MartinMartinSpieserKnoll, ArminArminKnollKnaepen, WernerWernerKnaepen2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28000Integration of the Sequential Infiltration Synthesis (SIS) on Polyphtaladehyde (PPA) resist for thermal Scanning Probe Lithography (t-SPL) patterningProceedings paper