Bai, QuanQuanBaiDialameh, MasoudMasoudDialamehMorris, RichardRichardMorrisVickridge, IanIanVickridgeVantomme, AndreAndreVantommeMeersschaut, JohanJohanMeersschaut2025-06-112024-03-012025-06-1120240042-207XWOS:001166370100001https://imec-publications.be/handle/20.500.12860/43610Elastic backscattering during boron implantation in Si1-xGexJournal article10.1016/j.vacuum.2023.112740WOS:001166370100001NUCLEAR-REACTION ANALYSISION-IMPLANTATIONRUTHERFORD BACKSCATTERINGTHIN-FILMSSIGEB-11(P,ALPHA)BE-8ACCURACYFLUENCEGROWTHENERGY