Monitoring plasma nitridation of HfSiOx by corona charge measurements

Everaert, Jean-LucJean-LucEveraertShi, XiaopingXiaopingShiRothschild, AudeAudeRothschildSchaekers, MarcMarcSchaekersRosseel, ErikErikRosseelPavelka, TiborTiborPavelkaDon, EricEricDonVanhaelemeersch, SergeSergeVanhaelemeersch2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12138Monitoring plasma nitridation of HfSiOx by corona charge measurementsJournal article