Everaert, Jean-LucJean-LucEveraertZschaetzsch, GerdGerdZschaetzschVecchio, EmmaEmmaVecchioVandervorst, WilfriedWilfriedVandervorstCunnane, LiamLiamCunnane2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13710Plasma doping control by mass metrologyProceedings paper