Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

de Marneffe, Jean-FrancoisJean-Francoisde MarneffeZhang, LipingLipingZhangHeyne, MarkusMarkusHeyneLukaszewicz, MikolasjMikolasjLukaszewiczPorter, Stephen BarryStephen BarryPorterVajda, FelimFelimVajdaRutigliani, VitoVitoRutiglianiKrishtab, MikhailMikhailKrishtabGoodyear, AndyAndyGoodyearCooke, MikeMikeCookeVerdonck, PatrickPatrickVerdonckBaklanov, MikhaïlMikhaïlBaklanov2021-10-222021-10-2220150021-8979https://imec-publications.be/handle/20.500.12860/25141Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectricsJournal articlehttp://scitation.aip.org/content/aip/journal/jap/118/13/10.1063/1.4932202