Analysis of As, P diffusion and defect evolution during sub-millisecond non-melt laser annealing based on an atomistic kinetic Monte Carlo approach

Noda, TaijiTaijiNodaVandervorst, WilfriedWilfriedVandervorstFelch, S.S.FelchParihar, V.V.PariharCuperus, AldertAldertCuperusMcintosh, R.R.McintoshVrancken, ChristaChristaVranckenRosseel, ErikErikRosseelBender, HugoHugoBenderVan Daele, BennyBennyVan DaeleNiwa, MasaakiMasaakiNiwaUmimoto, H.H.UmimotoSchreutelkamp, RobRobSchreutelkampAbsil, PhilippePhilippeAbsilJurczak, GosiaGosiaJurczakDe Meyer, KristinKristinDe MeyerBiesemans, SergeSergeBiesemansHoffmann, Thomas Y.Thomas Y.Hoffmann2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12624Analysis of As, P diffusion and defect evolution during sub-millisecond non-melt laser annealing based on an atomistic kinetic Monte Carlo approachProceedings paper