Claes, MartineMartineClaesLe, Quoc ToanQuoc ToanLeKesters, ElsElsKestersLux, MarcelMarcelLuxUrionabarrenetxea, AinaraAinaraUrionabarrenetxeaVereecke, GuyGuyVereeckeMertens, PaulPaulMertensCarleer, R.R.CarleerAdriaensens, P.P.Adriaensens2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/11872All wet strip approaches for post-etch photoresist layers after low-k patterningProceedings paper