Park, Min HyukMin HyukParkChung, Ching-ChangChing-ChangChungSchenk, TonyTonySchenkRichter, ClaudiaClaudiaRichterOpsomer, KarlKarlOpsomerDetavernier, ChristopheChristopheDetavernierAdelmann, ChristophChristophAdelmannJones, JacobJacobJonesMikolajick, ThomasThomasMikolajickSchroeder, UweUweSchroeder2021-10-262021-10-2620182199-160Xhttps://imec-publications.be/handle/20.500.12860/31490Effect of annealing ferroelectric HfO2 thin films: In situ, high temperature X-ray diffractionJournal articlehttps://doi.org/10.1002/aelm.201800091