Michelon, JulienJulienMichelonBruynseraede, ChristopheChristopheBruynseraedeTio Castro, DavidDavidTio CastroRoussel, PhilippePhilippeRousselHoofman, RomanoRomanoHoofmanMaex, KarenKarenMaex2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10890Electromigration study of sub-100nm Cu-linesProceedings paper