Impact of nitridation on recoverable and permanent negative bias temperature instability degradation in high-k/metal-gate p-type metal oxide semiconductor field effect transistors

Aoulaiche, MarcMarcAoulaicheKaczer, BenBenKaczerRoussel, PhilippePhilippeRousselHoussa, MichelMichelHoussaDe Gendt, StefanStefanDe GendtMaes, HermanHermanMaesGroeseneken, GuidoGuidoGroeseneken2021-10-172021-10-1720091071-1023https://imec-publications.be/handle/20.500.12860/14904Impact of nitridation on recoverable and permanent negative bias temperature instability degradation in high-k/metal-gate p-type metal oxide semiconductor field effect transistorsJournal article