A successful selective epitaxial Si1-xGex deposition process for HBT-BiCMOS and high-mobility heterojunction pMOS applications

Loo, RogerRogerLooCaymax, MattyMattyCaymaxPeytier, IvanIvanPeytierDecoutere, StefaanStefaanDecoutereCollaert, NadineNadineCollaertVerheyen, PeterPeterVerheyenVandervorst, WilfriedWilfriedVandervorstDe Meyer, KristinKristinDe Meyer2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9220A successful selective epitaxial Si1-xGex deposition process for HBT-BiCMOS and high-mobility heterojunction pMOS applicationsJournal article