Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using CMOS fabrication technology

Selvaraja, ShankarShankarSelvarajaBogaerts, WimWimBogaertsDumon, PieterPieterDumonVan Thourhout, DriesDriesVan ThourhoutBaets, RoelRoelBaets2021-10-182021-10-1820101077-260Xhttps://imec-publications.be/handle/20.500.12860/17969Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using CMOS fabrication technologyJournal article