Roy, SyamashreeSyamashreeRoyThiam, ArameArameThiamFeurprier, YannickYannickFeurprierFranke, Joern-HolgerJoern-HolgerFrankeSah, KaushikKaushikSahChen, ZhijinZhijinChenCheng, BoboBoboChengGong, ChenweiChenweiGongBaskaran, BalakumarBalakumarBaskaranBekaert, JoostJoostBekaertNafus, KathleenKathleenNafusFukui, NobuyukiNobuyukiFukuiTsuboi, AtsushiAtsushiTsuboiNiroomand, ArdavanArdavanNiroomandGillijns, WernerWernerGillijnsVats, HemantHemantVatsSherazi, YasserYasserSheraziCarballo, Victor M. BlancoVictor M. BlancoCarballo2025-07-312025-07-312025978-1-5106-8634-20277-786XWOS:001517286200035https://imec-publications.be/handle/20.500.12860/45987Advanced PnR Logic Patterning Enabled by High-NA EUV LithographyProceedings paper10.1117/12.3051054978-1-5106-8635-9WOS:001517286200035