Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling

Wei, Chih-, IChih-, IWeiKang, SeulkiSeulkiKangDas, SayantanSayantanDasOya, MasahiroMasahiroOyaOkamoto, YosukeYosukeOkamotoMaruyama, KotaroKotaroMaruyamaFenger, GermainGermainFengerLatypov, AzatAzatLatypovKusnadi, IrIrKusnadiKhaira, GurdamanGurdamanKhairaYamazaki, YuichiroYuichiroYamazakiGillijns, WernerWernerGillijnsHalder, SandipSandipHalderLorusso, GianGianLorusso2024-03-252024-02-272024-03-2520231932-5150WOS:001134890300025https://imec-publications.be/handle/20.500.12860/43596Applications of large field of view e-beam metrology to contour-based optical proximity correction modelingJournal article10.1117/1.JMM.22.4.041603WOS:001134890300025