Ronse, KurtKurtRonseDe Bisschop, PeterPeterDe BisschopEliat, AstridAstridEliatGoethals, MiekeMiekeGoethalsHermans, JanJanHermansJonckheere, RikRikJonckheereVan Den Heuvel, DieterDieterVan Den HeuvelVan Roey, FriedaFriedaVan RoeyBeckx, StephanStephanBeckxWouters, JanJanWoutersde Marneffe, Jean-FrancoisJean-Francoisde MarneffeO'Neil, TimothyTimothyO'NeilTirri, BruceBruceTirriSewell, HarryHarrySewell2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/8081Status 157nm lithography development at IMECProceedings paper