Double patterning with dual hard mask for 28nm node devices and below

Hody, HubertHubertHodyParaschiv, VasileVasileParaschivVecchio, EmmaEmmaVecchioLocorotondo, SabrinaSabrinaLocorotondoWinroth, GustafGustafWinrothAthimulam, RajaRajaAthimulamBoullart, WernerWernerBoullart2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22495Double patterning with dual hard mask for 28nm node devices and belowProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1674540