Reactive ion etch of Si3N4 spacers high selective to germanium

Altamirano Sanchez, EfrainEfrainAltamirano SanchezKunnen, EddyEddyKunnenDe Jaeger, BriceBriceDe JaegerBoullart, WernerWernerBoullart2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13297Reactive ion etch of Si3N4 spacers high selective to germaniumMeeting abstract