Lorusso, GianGianLorussoDavydova, NataliaNataliaDavydovaEurlings, MarkMarkEurlingsKaya, CemilCemilKayaPeng, YueYuePengFeenstra, KeesKeesFeenstraFedynyshyn, Theodore H.Theodore H.FedynyshynNatt, OliverOliverNattHuber, PeterPeterHuberZaczek, ChristophChristophZaczekYoung, StuartStuartYoungGraeupner, PaulPaulGraeupnerHendrickx, EricEricHendrickx2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19339Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experimentsProceedings paper