Comparison of the stability of the surface structure and H-termination of the H2 annealed and HF-last cleaned (100) silicon

Bender, HugoHugoBenderLi, LiLiLiMertens, PaulPaulMertensCaymax, MattyMattyCaymaxHeyns, MarcMarcHeyns2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/35Comparison of the stability of the surface structure and H-termination of the H2 annealed and HF-last cleaned (100) siliconProceedings paper