Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis

Fallica, RobertoRobertoFallicaHuang, WeizhongWeizhongHuangSuh, Hyo SeonHyo SeonSuhDe Simone, DaniloDaniloDe SimoneGuerrero, Douglas J.Douglas J.GuerreroKato, KodaiKodaiKato2024-02-052024-01-132024-02-052023978-1-5106-6748-80277-786XWOS:001125089900017https://imec-publications.be/handle/20.500.12860/43405Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysisProceedings paper10.1117/12.2687546978-1-5106-6749-5WOS:001125089900017