Ercken, MoniqueMoniqueErckenPollers, IngridIngridPollersVan Puyenbroeck, IlseIlseVan PuyenbroeckGoethals, MiekeMiekeGoethalsRonse, KurtKurtRonsePawlowski, G.G.PawlowskiSpiess, WalterWalterSpiess2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2566Optimization of an advanced positive DUV resist for 248 nm L/S pattern printingOral presentation