Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond

Baudot, SylvainSylvainBaudotSoussou, AssawerAssawerSoussouMilenin, AlexeyAlexeyMileninHopf, TobyTobyHopfWang, ShouhuaShouhuaWangWeckx, PieterPieterWeckxVincent, BenjaminBenjaminVincentErvin, JoeJoeErvinDemuynck, StevenStevenDemuynck2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/32502Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyondProceedings paperhttps://doi.org/10.1117/12.2514927