Driessen, FrankFrankDriessenPierrat, C.C.PierratVandenberghe, GeertGeertVandenbergheRonse, KurtKurtRonseVan Adrichem, PaulPaulVan AdrichemLiu, H.Y.H.Y.Liu2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7531Extending ArF to the 65-nm node with full-phase lithographyProceedings paper