Innovative design solutions for avoiding at-resolution field stitching in high-NA EUV lithography

Miyaguchi, KenichiKenichiMiyaguchiKim, Ryoung-HanRyoung-HanKimOak, ApoorvaApoorvaOakDrissi, YoussefYoussefDrissiChang, Chieh-MiaoChieh-MiaoChangLee, JeonghoonJeonghoonLeeSherazi, YasserYasserSheraziTrivkovic, DarkoDarkoTrivkovicLiu, Ru-GunRu-GunLiu2025-07-312025-07-312025978-1-5106-8636-60277-786XWOS:001517345700010https://imec-publications.be/handle/20.500.12860/45986Innovative design solutions for avoiding at-resolution field stitching in high-NA EUV lithographyProceedings paper10.1117/12.3051547978-1-5106-8637-3WOS:001517345700010