E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography

Zidan, MohamedMohamedZidanLorusso, GianGianLorussoDe Simone, DaniloDaniloDe SimoneDe Silva, AnujaAnujaDe SilvaHaider, AliAliHaiderVerveniotis, ElisseosElisseosVerveniotisMoussa, AlainAlainMoussaDe Gendt, StefanStefanDe Gendt2024-04-182024-04-1820231932-5150WOS:001134890300016https://imec-publications.be/handle/20.500.12860/43851E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithographyJournal article10.1117/1.JMM.22.4.044001WOS:001134890300016