Patterning challenges for direct metal etch of ruthenium and molybdenum at 32 nm metal pitch and below

Decoster, StefanStefanDecosterCamerotto, ElisabethElisabethCamerottoMurdoch, GayleGayleMurdochKundu, SouvikSouvikKunduJurczak, GosiaGosiaJurczakLe, Quoc ToanQuoc ToanLeTokei, ZsoltZsoltTokeiLazzarino, FredericFredericLazzarino2022-06-092022-05-222022-05-232022-06-092022-04-262166-2746WOS:000793148100002https://imec-publications.be/handle/20.500.12860/39869Patterning challenges for direct metal etch of ruthenium and molybdenum at 32 nm metal pitch and belowJournal article10.1116/6.0001791WOS:000793148100002Applied physicsRUMODirect metal etchMolybdenumRutheniumdry etch