Characterization of ultra-thin nickel-silicide films synthesized using the solid state reaction of Ni with an underlying Si:P substrate (P: 0.7 to 4.0%)

Peter, AntonyAntonyPeterYu, HaoHaoYuDutta, ShibeshShibeshDuttaRosseel, ErikErikRosseelVan Elshocht, SvenSvenVan ElshochtPaulussen, KrisKrisPaulussenMoussa, AlainAlainMoussaVaesen, IngeIngeVaesenSchaekers, MarcMarcSchaekers2021-10-232021-10-2320160167-9317https://imec-publications.be/handle/20.500.12860/27132Characterization of ultra-thin nickel-silicide films synthesized using the solid state reaction of Ni with an underlying Si:P substrate (P: 0.7 to 4.0%)Journal articlehttp://www.sciencedirect.com/science/article/pii/S0167931716300910