A novel approach for the elimination of the pattern density dependence of CMP for shallow trench isolation

Grillaert, JoostJoostGrillaertHeylen, NancyNancyHeylenVrancken, EviEviVranckenBadenes, GonçalGonçalBadenesRooyackers, RitaRitaRooyackersMeuris, MarcMarcMeurisHeyns, MarcMarcHeyns2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2595A novel approach for the elimination of the pattern density dependence of CMP for shallow trench isolationProceedings paper