Advances in process optimization for dual-tone development as a double patterning technique

Fonseca, CarlosCarlosFonsecaSomervell, MarkMarkSomervellBernard, SophieSophieBernardHatakeyama, ShinichiShinichiHatakeyamaNafus, KathleenKathleenNafusLeeson, MichaelMichaelLeesonScheer, StevenStevenScheerGronheid, RoelRoelGronheid2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13735Advances in process optimization for dual-tone development as a double patterning techniqueProceedings paper