Satta, AlessandraAlessandraSattaSchuhmacher, JörgJörgSchuhmacherWhelan, CarolineCarolineWhelanVandervorst, WilfriedWilfriedVandervorstBrongersma, SywertSywertBrongersmaBeyer, GeraldGeraldBeyerBrijs, BertBertBrijsConard, ThierryThierryConardMaex, KarenKarenMaexVantomme, AndreAndreVantommeViitanen, M.M.M.M.ViitanenBrongersma, H.H.H.H.Brongersma2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6791A study of growth mechanism of TiN and WCN barrier films deposited by atomic layer deposition on different substratesMeeting abstract