Palov, P.A.P.A.PalovMankelevich, Yu. A.Yu. A.MankelevichRakhimova, T. V.T. V.RakhimovaShamiryan, DenisDenisShamiryan2021-10-182021-10-1820101063-780Xhttps://imec-publications.be/handle/20.500.12860/17758Charging of submicron structures during silicon dioxide etching in oneJournal article