(Sub-) 100-nm gate patterning using 248-nm alternating PSM

Vandenberghe, GeertGeertVandenbergheJaenen, PatrickPatrickJaenenJonckheere, RikRikJonckheereRonse, KurtKurtRonseToublan, O.O.Toublan2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5766(Sub-) 100-nm gate patterning using 248-nm alternating PSMProceedings paper