H2/D2 isotopic effect on negative bias temperature instabilities in SiOx/HfSiON/TaN gate stacks

Houssa, MichelMichelHoussaAoulaiche, MarcMarcAoulaicheStesmans, AndreAndreStesmansDe Gendt, StefanStefanDe GendtGroeseneken, GuidoGuidoGroesenekenHeyns, MarcMarcHeyns2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10612H2/D2 isotopic effect on negative bias temperature instabilities in SiOx/HfSiON/TaN gate stacksOral presentation