Jakschik, S.S.JakschikKauerauf, ThomasThomasKaueraufDegraeve, RobinRobinDegraeveHwang, Young NamYoung NamHwangDuschl, R.R.DuschlKerber, M.M.KerberAvellan, A.A.AvellanKudelka, S.S.Kudelka2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12348Influence of stress-induced leakage current on reliability of HfSiOxJournal article