Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide

Krishtab, MikhailMikhailKrishtabArmini, SilviaSilviaArminiMeersschaut, JohanJohanMeersschautDe Gendt, StefanStefanDe GendtAmeloot, RobRobAmeloot2022-03-032021-11-022022-03-0320211944-8244WOS:000674333400103https://imec-publications.be/handle/20.500.12860/37774Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium OxideJournal article10.1021/acsami.1c04405WOS:000674333400103BLOCK-COPOLYMERSBOTTOM-UPSURFACETIO2RUTHENIUMPHASEFILMSMEDLINE:34160190